Quava Mega Puck Flow Single Wafer Cleaning System
Kaijo’s Quava Mega Puck Flow single wafer cleaning system is designed for higher flow rates and higher rotational velocity for near-proximity cleaning of silicon wafers and other applications, including HDD media and FPD glass. The Mega Puck Flow processes one wafer at a time on a rotating spin chuck, delivering megasonic energy and rinse chemistry directly to each wafer’s surface rather than through a shared batch bath, giving every wafer identical, isolated exposure regardless of what ran before it. The megasonic transducer directs high-power acoustic energy by scanning across large surfaces.
Single-Wafer vs. Batch: Where This System Fits
Unlike cassette-based batch systems that clean multiple wafers together in a shared tank, the Mega Puck Flow cleans one wafer at a time, mounting each wafer individually and scanning megasonic energy directly across its surface rather than immersing a full lot in common chemistry. That distinction matters most at advanced nodes and on critical layers, where cross-contamination risk and tight process tolerances rule out shared baths. Because chemistry and acoustic energy are delivered fresh to each wafer, there’s no batch-to-batch drift and no risk of a contaminant from one wafer redepositing on the next- the same isolation-driven precision that makes single-wafer cleaning the standard for sub-batch-tolerant process steps increasingly.
The Mega Puck Flow’s flow rate, rotational velocity, and frequency/oscillation mode are all independently tunable per application, which is what makes single-wafer processing practical here rather than just theoretically cleaner: a process team can match acoustic intensity to a specific wafer’s sensitivity and contamination profile on a run-by-run basis, something a shared batch tank, set once for the whole cassette, can’t do.
Kaijo offers a full line of high-performance Megasonic Cleaning systems and equipment to meet your specific cleaning requirements. If you have questions about the Quava Mega Puck Flow single wafer cleaning system or want more information on how our products can support your application, call us at 408 675-5575.
Quava Mega Puck Flow Single Wafer Cleaning System
Benefits:
- Optional Frequency and Oscillation mode selections can be used for different applications
- Provides superfine, precise cleaning of silicon wafers, HHD media, and flat panel display glass
- Cost-effective and easy to use
- An effective turnkey manufacturing solution
- Megasonic energy is directly applied to the target object
- An effective turnkey manufacturing solution
- Single-wafer processing: each wafer is cleaned individually, eliminating the cross-contamination risk of shared batch or cassette tanks.
- Higher flow rate than the original Mega Puck
- Greater allowable rotational velocity of target substrate than the original Mega Puck
- Greater allowable distance from the target substrate to clear holding pins
Features:
- Can be used with DI Water or Chemical
- Can communicate with host PC
- Remove output power control
- Output power meter with 4-digit display
- No field calibration is needed when replacing a generator or transducer
- High-frequency 950kHz
- Set point control in 0.1-watt increments
- Average power variation ±1%
- Programmable Soft Start and Soft Stop function
- Supply voltage range from 100 VAC to 240 VAC
Mega Puck Flow Generator Specifications
(WxDxH) in mm
Mega Puck Flow Megasonic Transducer Specifications
Mega Puck Flow Megasonic Transducer -top view
Mega Puck Flow Megasonic Transducer -side view
Mega Puck Flow Megasonic Transducer stainless steel -side view
Mega Puck Flow Megasonic Transducer stainless steel -bottom view
If you have questions about the Quava Mega Puck Flow single wafer cleaning system or need more information on how our products can support your application, call us at 408 675-5575 or email info@kaijo-shibuya.com.
