Ultrasonic Systems for Precise Cleaning Applications
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Kaijo’s New Mega Puck Flow Megasonic System Provides Optimized Cleaning

March 7, 2023

Kaijo’s New Mega Puck Flow Megasonic System Provides Optimized CleaningWhen single components need high-precision cleaning, Kaijo’s new Mega Puck Flow silicon wafer cleaning system represents an ideal solution. Silicon wafers, hard disk drive platters, and flat panel display glass are fragile, but films or contaminating particles often have to be removed from their surfaces. The Mega Puck Flow System delivers precise megasonic cleaning while scanning in near proximity of the surface to be cleaned. It can clean contamination from manufactured components before assembly or reduce particle counts on semiconductor wafers to ready them for further processing. Kaijo’s new Mega Puck Flow system includes a higher-performance megasonic transducer with better cleaning performance and greater versatility than the original Mega Puck version.

The Mega Puck Flow System Cleans Delicate Parts Quickly

Flat items such as silicon wafers or glass plates can be cleaned quickly and effectively with Kaijo’s new Mega Puck Flow System. While such parts are delicate and may be subject to surface damage, the Mega Puck system uses high-frequency sound waves to deliver gentle cleaning. Sound wave frequencies in the megahertz range produce large numbers of microscopic cavitation bubbles that are less energetic than those produced by lower frequencies. As a result, megasonic cleaning works quickly without damaging fragile components.

The megasonic transducer that produces high-frequency sound waves in the cleaning solution is located at the bottom of the Mega Puck. The cleaning solution is pumped through the Mega Puck so that it floats over the surface of the part to be cleaned. The part rotates rapidly while the Mega Puck moves back and forth, delivering the cleaning solution with cavitation bubbles evenly over the entire part surface. The action of the cavitation bubbles dislodges contaminating particles and cleans films from part surfaces. The cleaning solution can be made up of plain water, deionized water, or cleaning chemicals. As the cleaning solution flows across the part surface, it washes away the dislodged impurities.

The Improved Mega Puck Provides Substantial Benefits

The Mega Puck Flow system delivers acoustic cleaning energy directly to the surface of the part to be cleaned. In addition, the system features a higher flow rate and a faster rotational speed. The higher flow rate lets the puck hover at a greater distance from the surface to be cleaned, allowing the puck to clear holding pins and clean right to the edge of parts such as silicon wafers.

Some parts require chemical solutions to remove specific contaminants. The Mega Puck is compatible with many cleaning chemicals and is available in a stainless-steel version if required. The use of detergents or cleaning chemicals, together with the megasonic cleaning action of the cavitation bubbles, provides unparalleled cleaning performance that can’t be matched with traditional cleaning methods.

The megasonic cleaning system consists of the Mega Puck transducer and a megasonic generator that produces a high-frequency signal. Together they represent a cost-effective and easy-to-use turn-key solution for industrial cleaning applications. If used for several different cleaning tasks, the operating frequency and the oscillation mode can be selected via an optional feature. The system is self-adjusting so that no field calibration is needed when a generator or transducer is changed. A standard remote-control interface allows easy integration into existing cleaning systems, and the system can communicate with a host PC.

Kaijo Provides Innovative Solutions to Meet Customer Needs

Kaijo continues to develop innovative solutions to cleaning requirements customers have in many different industries. The company has extensive experience in ultrasonic and megasonic technology and leverages its in-house expertise to meet customer precision cleaning needs. Kaijo’s Mega Puck Flow silicon wafer cleaning system takes an existing product and adds versatility to produce improved cleaning performance. Kaijo works closely with customers to make sure new products deliver excellent cleaning solutions. Contact Kaijo for a free consultation to discuss your specific cleaning application.