Ultrasonic Systems for Precise Cleaning Applications
2045 Martin Avenue, Suite 204 Santa Clara, CA 95050

Optimizing Semiconductor Fabrication with Advanced Megasonic Cleaning

April 4, 2024

Because a high level of silicon wafer cleanliness is critical for semiconductor product quality, removing contaminating particles is a crucial feature of semiconductor manufacturing. Microscopic particles clinging to wafer surfaces can block silicon etching or the deposit of conducting paths. The resulting products can be defective or have a reduced lifespan. Reducing the particle count […]

Read More

Maximizing Efficiency in Wafer Cleaning Systems

February 6, 2024

The evolution of the semiconductor industry is marked by continuous progress and an unwavering commitment to precision. Central to this journey is the critical process of silicon wafer cleaning, an essential step in the fabrication of semiconductors. As the industry continues to evolve, the demand for more efficient and precise cleaning methods grows, making it […]

Read More

Kaijo’s New Mega Puck Flow Megasonic System Provides Optimized Cleaning

March 7, 2023

When single components need high-precision cleaning, Kaijo’s new Mega Puck Flow silicon wafer cleaning system represents an ideal solution. Silicon wafers, hard disk drive platters, and flat panel display glass are fragile, but films or contaminating particles often have to be removed from their surfaces. The Mega Puck Flow System delivers precise megasonic cleaning while […]

Read More

Why Large Processing Systems Incorporate Megasonic Cleaners

December 20, 2022

While periodic cleaning is part of many large processing systems, getting parts and components completely clean can be challenging. Conventional cleaning methods can involve time-consuming manual scrubbing or soaking in toxic chemicals. Parts and equipment may be easily damaged. Workers may be injured from manual cleaning methods or exposure to harmful chemicals. Product quality can […]

Read More

New Methodology for Megasonic Cleaning of Flat Panel Glass

May 24, 2022

While ultrasonic systems deliver excellent cleaning performance, large flat panels are difficult to clean completely, even if placed in an oversized ultrasonic cleaning tank. Large tanks may have problems with even cleaning and with the circulation of the cleaning solution. To address this problem Kaijo has developed a new method for cleaning and handling large […]

Read More

Incorporating Megasonic Cleaners into Large Processing Systems

May 5, 2021

As production part cleaning requirements become more stringent, environmental regulations are restricting the use of the aggressive chemicals commonly used in large processing systems. Manufacturing lines often incorporate cleaning steps to prepare parts for subsequent processing. Cleaning may include manual scrubbing, pressure washing and soaking in hot chemical baths. Modern products often include heat-sensitive components, […]

Read More

How Megasonic Cleaners Improve Semiconductor Processing

August 21, 2019

Semiconductor manufacturing involves a large number of process steps that etch silicon wafers and deposit thin films. Between the steps, the silicon wafers have to be cleaned to remove traces of chemicals and particles in preparation for the subsequent step. Cleaning is usually done with powerful chemicals such as acids and peroxides that remove undesirable […]

Read More

Defining Ultrasonic and Megasonic Frequencies

April 27, 2018

Sound energy propagates not in vacuum the way radio-frequency energy does, but within physical mediums. When matter is subjected to sound energy, it is stimulated in a way that forms a rippling propagation — like waves in a body of water. You would also be able to see sound energy pass through a visible medium […]

Read More

How a Megasonic Cleaning System Removes Submicron Particles from Delicate Components

February 27, 2017

Megasonic cleaning systems use high frequency generators and transducers operating in the MHz range to clean delicate parts such as silicon wafers, and related microelectronic devices. Semiconductor manufacturing processes rely on repeated cleaning operations, and megasonic systems clean more rapidly and more completely than other cleaning methods in many applications. Megasonic cleaning systems are especially […]

Read More