Ultrasonic Systems for Precise Cleaning Applications
2045 Martin Avenue, Suite 204 Santa Clara, CA 95050

How Megasonic Cleaners Improve Semiconductor Processing

August 21, 2019

Semiconductor manufacturing involves a large number of process steps that etch silicon wafers and deposit thin films. Between the steps, the silicon wafers have to be cleaned to remove traces of chemicals and particles in preparation for the subsequent step. Cleaning is usually done with powerful chemicals such as acids and peroxides that remove undesirable […]

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Defining Ultrasonic and Megasonic Frequencies

April 27, 2018

Sound energy propagates not in vacuum the way radio-frequency energy does, but within physical mediums. When matter is subjected to sound energy, it is stimulated in a way that forms a rippling propagation — like waves in a body of water. You would also be able to see sound energy pass through a visible medium […]

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How a Megasonic Cleaning System Removes Submicron Particles from Delicate Components

February 27, 2017

Megasonic cleaning systems use high frequency generators and transducers operating in the MHz range to clean delicate parts such as silicon wafers, and related microelectronic devices. Semiconductor manufacturing processes rely on repeated cleaning operations, and megasonic systems clean more rapidly and more completely than other cleaning methods in many applications. Megasonic cleaning systems are especially […]

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